Two-dimensional Materials

Invited Speakers:

  • Shusuke Kasamatsu, University of Tokyo, Japan
    First-principles Simulation of Capacitance at The Nanoscale: Dead Layer Effect and Negative Capacitance
  • Fei Ma,¬†Xi’an Jiaotong University, China
    Fabrication of Graphene on SiC and the Edge/strain Modulated Electronic States
  • Jun Nakamura, University of Electro-Communications, Japan
    First-principles Evaluation of The Oxygen Reduction Reaction on Nitrogen-doped Graphene
  • Gilles Renaud,¬†Institute for Nanoscience and Cryogenics, France
    Monitoring the Growth of  Nanostructures, Epitaxial Thin Films and 2D Atomic Layered Materials with in Situ Synchrotron X-ray Scattering

 

 

 

Workshop Chair:

Operating Organization

OAHOST
Sponsors
UESTC
IFFS
UARK

Springer

Important Dates

Abstract deadline:
October 20, 2015
Registration for early birds:
September 1, 2015

Contact us;
Conference Assisstance
Ms Emily Yuan
emnbangkok2015@hotmail.com
bangkok@emnmeeting.org