Plasma Electronics and Lasers

Invited Speakers:

  • Masataka Hasegawa, Nanomaterials Research Institute, AIST, Japan
    Graphene synthesis by plasma process towards high-throughput production
  • Masao Sakuraba, RIEC, Tohoku University, Japan
    Group-IV Quantum-Heterostructure Formation Based on Low-Energy Plasma CVD towards Electronic Device Application
  • Takahiro Yamada, Osaka University, Japan
    H Atom Density Diagnostics in High-Pressure Microwave Hydrogen Plasma by Power Balance Calorimetry and Actinometry

News

We very much regret to say that due to the family reason, Prof. Albert Fert would have to provisionally cancel his participation and visit to Hong Kong on December.

The meeting program published.

Apologies for the coming one-day excursion plan change, due to some problems caused by visas needed to Macao, we have to again plan the excursion schedules still in Hong Kong this time.

The meeting program was finalized now.

Operating Organization

OAHOST
Sponsors
UESTC
University of Electronic Science and Technology of China
UARK

Springer

Contact Us

Conference Assistant Miss Karen Wang

emnhongkong2015@outlook.com
karen@emnmeeting.org